The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 07, 2019
Filed:
May. 26, 2014
Japan Science and Technology Agency, Saitama, JP;
Ayabo Corporation, Anjo-shi, Aichi, JP;
Atsushi Nakajima, Saitama, JP;
Hironori Tsunoyama, Saitama, JP;
Chuhang Zhang, Saitama, JP;
Hiroki Akatsuka, Saitama, JP;
Keizo Tsukamoto, Anjo, JP;
JAPAN SCIENCE AND TECHNOLOGY AGENCY, Saitama, JP;
AYABO CORPORATION, Anjo-Shi, Aichi, JP;
Abstract
Improvement of control of size and structure of nanoclusters with a nanocluster production apparatus is intended. Increase of an obtained amount and a yield of nanoclusters having size and structure, at least one of which is selected, is intended. A nanocluster production apparatus has a vacuum chamber, a sputtering source that generates plasma by pulse discharge, a pulse power supply that supplies a pulsed power to the sputtering source, a first inert gas supply device that supplies a first inert gas to the sputtering source, a cluster growth cell stored in the vacuum chamber and a second inert gas introduction device that introduces a second inert gas into the cluster growth cell.