The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 07, 2019
Filed:
Nov. 10, 2016
Leibniz-institut Für Plasmaforschung Und Technologie E.v., Greifswald, DE;
Leibniz-Institut für Plasmaforschung und Technologie e.V., Greifswald, DE;
Abstract
The device for treating an object with plasma comprises a jacket apparatus () which forms, or can form, a substantially gas-tight holding chamber () in which an object () to be treated can be accommodated. The device comprises a first electrode () and a second electrode (), wherein the two electrodes () are arranged with reference to the jacket apparatus () such that a plasma () can be generated in the holding chamber () of the jacket apparatus (). A wall () of the jacket apparatus () forming the holding chamber () of the jacket apparatus () has a modulus of elasticity of Ew<10 kN/mm, at least in sections. The device comprises a housing (), by means of which a housing interior () is or can be formed, wherein the jacket apparatus () is arranged within the interior of the housing ().