The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 07, 2019

Filed:

May. 22, 2017
Applicant:

Honda Motor Co., Ltd., Minato-ku, Tokyo, JP;

Inventors:

Yan Lu, Raymond, OH (US);

Jiawei Huang, Raymond, OH (US);

Yi-Ting Chen, Sunnyvale, CA (US);

Bernd Heisele, Mountain View, CA (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01S 17/89 (2006.01); G01S 17/88 (2006.01); G06T 7/73 (2017.01); G01S 17/02 (2006.01); G06T 7/13 (2017.01);
U.S. Cl.
CPC ...
G06T 7/73 (2017.01); G01S 17/023 (2013.01); G01S 17/89 (2013.01); G06T 7/13 (2017.01); G06T 2207/30244 (2013.01); G06T 2207/30252 (2013.01);
Abstract

The present disclosure relates to methods and systems for monocular localization in urban environments. The method may generate an image from a camera at a pose. The method may receive a pre-generated map, and determine features from the generated image based on edge detection. The method may predict a pose of the camera based on at least the pre-generated map, and determine features from the predicted camera pose. Further, the method may determine a Chamfer distance based upon the determined features from the image and the predicted camera pose, optimize the determined Chamfer distance based upon odometry information and epipolar geometry. Upon optimization, the method may determine an estimated camera pose.


Find Patent Forward Citations

Loading…