The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 07, 2019
Filed:
May. 04, 2016
Massachusetts Institute of Technology, Cambridge, MA (US);
Shivang R. Dave, Boston, MA (US);
Germán González Serráno, Mutxamel, ES;
Massachusetts Institute of Technology, Cambridge, MA (US);
Abstract
Non-uniformities in substrate thickness and surface topography contribute significantly to the need for auto-focusing on a sample deposited thereon. These auto-focusing needs can be reduced or eliminated by measuring and storing substrate surface topography for later retrieval by an imaging system that can use the topographic information to help set appropriate focal parameters. These steps can be done in advance of an imaging experiment to reduce focus-related delays during the experiment. Topographic information can be stored, for example, in a database, associated with a representation of a unique substrate identifier; entry of the representation retrieves the topographic information. As another example, topographic information can be stored in an encoding device associated with the substrate.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile