The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 07, 2019
Filed:
May. 30, 2013
Canon Kabushiki Kaisha, Tokyo, JP;
Tadashi Arai, Utsunomiya, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
A mask data generation method includes obtaining data of a pattern including a plurality of pattern elements, dividing a region of the pattern into a plurality of sections so that each pattern element is arranged in each section by using the obtained data of the pattern and generating map data including information indicative of presence or absence of the pattern element in each section, setting one piece of mask individual information out of a plurality pieces of mask individual information for each section including the pattern element by using a constraint condition, which inhibits setting of same mask individual information in a constraint region including one section and surrounding sections thereof, and the map data, and generating the data of the plurality of masks corresponding to the plurality pieces of mask individual information by using the set mask individual information.