The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 07, 2019

Filed:

Jul. 27, 2015
Applicant:

Hitachi, Ltd, Tokyo, JP;

Inventors:

Lili Zheng, Farmington Hills, MI (US);

Wei Yuan, Farmington Hills, MI (US);

Harsha Badarinarayan, Canton, MI (US);

Assignee:

Hitachi, Ltd., Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C22F 1/04 (2006.01); G05B 19/4099 (2006.01); C21D 8/00 (2006.01); C22F 1/10 (2006.01); C22F 1/06 (2006.01); C22F 1/08 (2006.01); C22F 1/18 (2006.01); C22C 1/00 (2006.01);
U.S. Cl.
CPC ...
G05B 19/4099 (2013.01); C21D 8/005 (2013.01); C22C 1/00 (2013.01); C22F 1/04 (2013.01); C22F 1/06 (2013.01); C22F 1/08 (2013.01); C22F 1/10 (2013.01); C22F 1/183 (2013.01); G05B 2219/35134 (2013.01); G05B 2219/49007 (2013.01);
Abstract

A process for designing and manufacturing a cavitation erosion resistant component. The process includes selecting a base material for use in a cavitation erosion susceptible environment and conducting a uniaxial loading test on a sample of the selected material. Thereafter, atomic force microscopy (AFM) topography on a surface of the tested sample is conducted and used to provide a surface strain analysis. The process also includes crystal plasticity finite element modeling (CPFEM) of uniaxial loading and CPFEM nanoindentation of the selected material over a range of values for at least one microstructure parameter. A subrange of microstructure parameter values that correlate to CPFEM nanoindentation results that provide increased CE resistance is determined. Finally, a component having an average microstructure parameter value that falls within the subrange of microstructure parameter values is manufactured.


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