The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 07, 2019

Filed:

Aug. 05, 2016
Applicant:

Boe Technology Group Co., Ltd., Beijing, CN;

Inventors:

Zhengliang Li, Beijing, CN;

Shi Shu, Beijing, CN;

Zhanfeng Cao, Beijing, CN;

Bin Zhang, Beijing, CN;

Xiaolong He, Beijing, CN;

Qi Yao, Beijing, CN;

Jincheng Gao, Beijing, CN;

Feng Guan, Beijing, CN;

Xuefei Sun, Beijing, CN;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); G02F 1/1362 (2006.01); H01L 27/12 (2006.01);
U.S. Cl.
CPC ...
G02F 1/136209 (2013.01); H01L 27/1218 (2013.01); H01L 27/1222 (2013.01); H01L 27/1259 (2013.01);
Abstract

A manufacturing method of an array substrate, an array substrate and a display device are provided. The method includes the following operations: forming a light shielding layer formed of a metal blacken production on a base substrate, wherein the metal blacken production is a product by blackening a metal; forming a preset film layer on the base substrate which is provided with the light shielding layer; forming both a pattern of the light shielding layer and a pattern of the preset film layer through one patterning process. The method of forming a pattern of the light shielding layer and a pattern of the preset film layer through one patterning process saves one patterning process.


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