The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 07, 2019
Filed:
Jun. 24, 2014
Us Synthetic Corporation, Orem, UT (US);
Debkumar Mukhopadhyay, Sandy, UT (US);
Brandon Paul Linford, Draper, UT (US);
Jed Clarke, Springville, UT (US);
US SYNTHETIC CORPORATION, Orem, UT (US);
Abstract
Embodiments relate to polycrystalline diamond compacts and methods of manufacturing such compacts in which an at least partially leached polycrystalline diamond ('PCD') table is infiltrated with first and second infiltrants. The first infiltrant includes a low viscosity cobalt-based and/or nickel-based alloy infiltrant. The second infiltrant (e.g., copper) is specifically selected to be more easily infiltrated and/or removed (e.g., leached) than a pure cobalt infiltrant. In an embodiment, a method includes forming a PCD table in the presence of a metal-solvent catalyst in a first high-pressure/high-temperature ('HPHT') process. The PCD table may be at least partially leached to remove at least a portion of the metal-solvent catalyst therefrom. The leached PCD table and a substrate are subjected to a second HPHT process effective to bond the substrate to the leached PCD table while at least partially infiltrating the PCD table with at least the first and second infiltrants.