The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 07, 2019
Filed:
Mar. 18, 2014
Corning Laser Technologies Gmbh, Krailling, DE;
Rico Bohme, Rochlitz, DE;
CORNING LASER TECHNOLOGIES GMBH, Krailling, DE;
Abstract
The present invention relates to a method for producing a contour in a planar substrate and for separating the contour from the substrate, in particular for producing an internal contour in a planar substrate and for removing the internal contour from the substrate, wherein, in a contour definition step by means of a laser beam guided over the substrate along a contour line characterizing the contour to be produced, a large number of individual zones of internal damage is produced in the substrate material, in a crack definition step by means of a laser beam guided over the substrate along a plurality of crack line portions, which, viewed from the contour line, leads away at an angle a>0°, and into the contour to be separated, respectively a large number of individual zones of internal damage is produced in the substrate material and, in a material removal step implemented after the contour definition step and after the crack definition step by means of a material-removing laser beam guided over the substrate along a material removal line which extends along the contour line but at a spacing from the latter and also in the contour to be separated, furthermore which preferably cuts the crack line portions, the substrate material is removed over the entire substrate thickness.