The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 07, 2019

Filed:

May. 10, 2017
Applicant:

Toyo Engineering Corporation, Tokyo, JP;

Inventors:

Genshi Nishikawa, Narashino, JP;

Yuta Abe, Narashino, JP;

Keiji Sano, Narashino, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B01D 3/00 (2006.01); C02F 1/02 (2006.01); C02F 1/20 (2006.01); B01D 19/00 (2006.01); C02F 101/16 (2006.01); C02F 103/36 (2006.01);
U.S. Cl.
CPC ...
C02F 1/025 (2013.01); B01D 3/009 (2013.01); B01D 19/001 (2013.01); C02F 1/20 (2013.01); C02F 2101/16 (2013.01); C02F 2103/36 (2013.01); C02F 2209/02 (2013.01); C02F 2209/03 (2013.01); C02F 2209/40 (2013.01); C02F 2301/08 (2013.01);
Abstract

A method for treating a urea aqueous solution includes a first stripping step of steam stripping an aqueous solution containing urea, ammonia and carbon dioxide at 0.2 to 0.6 MPaA in a first stripper to separate ammonia and carbon dioxide from this aqueous solution into a gas phase; a hydrolysis step of hydrolyzing urea in the solution obtained from the first stripping step at an LHSV of 10 to 20 h, at 1.1 to 3.1 MPaA and 180 to 230° C. in a catalytic hydrolyzer; and a second stripping step of steam stripping a liquid obtained in the hydrolysis step in a second stripper to separate ammonia and carbon dioxide from this liquid into a gas phase. The residual urea concentration can be reduced to 1 ppm or lower; the residual ammonia concentration can be decreased; LHSV can be increased; and an increase in apparatus size is minimized.


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