The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 07, 2019
Filed:
Apr. 02, 2018
Headway Technologies, Inc., Milpitas, CA (US);
Yue Liu, Fremont, CA (US);
Yuhui Tang, Milpitas, CA (US);
Moris M. Dovek, San Jose, CA (US);
Kowang Liu, Fremont, CA (US);
Headway Technologies, Inc., Milpitas, CA (US);
Abstract
A dual PMR writer is disclosed wherein the better writer at outer diameter (OD) skew is paired with a suspension after dynamic performance (DP) spin stand testing so that the better writer is the inner writer formed closer to a recording disk center than the other writer. Accordingly, lower read write offset is achieved at OD skew and better area density capability is realized. Preferably, there is a symmetrical or substantially symmetrical air bearing surface design after lapping and spin stand testing to afford flexibility in pairing an up facing (UP) head configuration with an UP suspension, or a down facing (DN) head configuration with a DN suspension to enable the better writer to be the inner writer. The dual PMR writer may have a dual dynamic fly height heater on each side of a center plane separating the two writers to improve write gap protrusion in the better writer.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile