The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 07, 2019

Filed:

Nov. 20, 2015
Applicant:

Screen Holdings Co., Ltd., Kyoto, JP;

Inventor:

Hiroyuki Ogura, Kyoto, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B05D 1/00 (2006.01); B05C 11/06 (2006.01); B05C 5/02 (2006.01); B05B 1/04 (2006.01); B05D 3/04 (2006.01); B05B 13/02 (2006.01); B05B 13/04 (2006.01); G03F 7/16 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
B05C 5/0254 (2013.01); B05B 1/044 (2013.01); B05B 13/0228 (2013.01); B05B 13/0421 (2013.01); B05B 13/0442 (2013.01); B05C 11/06 (2013.01); B05D 1/005 (2013.01); B05D 3/04 (2013.01); G03F 7/162 (2013.01); H01L 21/6715 (2013.01);
Abstract

A slit opening of a slit nozzle extends unidirectionally in a longitudinal direction from near the center of a circular substrate to near an outer edge of the substrate, and has a length in the longitudinal direction equal to or smaller than a radius of the substrate. When the slit nozzle discharges chemical onto the substrate, a rotary holder rotates the substrate and the slit nozzle relatively to each other about the center of the substrate. Accordingly, the chemical from the slit nozzle all adheres to a surface of the substrate to form an excellent liquid column and a chemical film on an almost entire surface of the substrate along the outer edge of the circular substrate. This yields satisfactory coating of the substrate with the chemical while waste chemical is suppressed.


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