The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 07, 2019
Filed:
Sep. 29, 2017
Canon Kabushiki Kaisha, Tokyo, JP;
Kenichi Saito, Tokyo, JP;
CANON KABUSHIKI KAISHA, Tokyo, JP;
Abstract
An apparatus for measuring a fundus of a subject. The apparatus includes a focusing unit which adjusts a defocus of the apparatus. The focusing unit includes a first focusing mirror and a second focusing mirror. The first focusing mirror and second focusing mirror are arranged so that an incident beam from the light source entering the focusing unit and an emitted beam exiting the focusing unit are substantially parallel to each other. Adjustment of the defocus is accomplished by moving both first focusing mirror and second focusing mirror such that incident beam and emitted beam remain substantially parallel to each other. The apparatus includes a wavefront sensor for detecting a shape of a wavefront. The apparatus includes a wavefront correction device. The wavefront correction device adjusts a wavefront of the light from the light source based on the shape of the wavefront detected by the wavefront sensor.