The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 30, 2019

Filed:

Oct. 31, 2017
Applicant:

Fujitsu Limited, Kawasaki-shi, Kanagawa, JP;

Inventor:

Shirou Ozaki, Yamato, JP;

Assignee:

FUJITSU LIMITED, Kawasaki, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/40 (2006.01); H01L 49/02 (2006.01); H01L 29/20 (2006.01); H01L 29/205 (2006.01); H01L 29/778 (2006.01); H01L 23/66 (2006.01); H01L 29/66 (2006.01); H01L 23/495 (2006.01); H01L 23/31 (2006.01); H02M 1/42 (2007.01); H02M 5/458 (2006.01); H03F 1/32 (2006.01); H03F 3/193 (2006.01); H03F 3/213 (2006.01); H01L 27/06 (2006.01); H01L 23/482 (2006.01); H03F 3/195 (2006.01); H03F 3/24 (2006.01);
U.S. Cl.
CPC ...
H01L 29/408 (2013.01); H01L 23/3114 (2013.01); H01L 23/4821 (2013.01); H01L 23/4952 (2013.01); H01L 23/49513 (2013.01); H01L 23/66 (2013.01); H01L 27/0629 (2013.01); H01L 28/60 (2013.01); H01L 29/2003 (2013.01); H01L 29/205 (2013.01); H01L 29/401 (2013.01); H01L 29/66462 (2013.01); H01L 29/7787 (2013.01); H02M 1/4208 (2013.01); H02M 5/458 (2013.01); H03F 1/3241 (2013.01); H03F 1/3247 (2013.01); H03F 3/193 (2013.01); H03F 3/195 (2013.01); H03F 3/213 (2013.01); H03F 3/245 (2013.01); H01L 23/49562 (2013.01); H01L 2223/6683 (2013.01);
Abstract

A semiconductor device includes a compound semiconductor layer, a gate electrode, and first and second insulating layers. The first insulating layer covers the gate electrode on the compound semiconductor layer and has a cavity that surrounds the gate electrode. The second insulating layer is provided on the first insulating layer and has an opening at a position corresponding to the cavity. A part of the second insulating layer, which is provided on the first insulating layer that covers the gate electrode, corresponding to the cavity is removed via the opening, so that the generation of parasitic capacitance due to the second insulating layer is suppressed.


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