The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 30, 2019

Filed:

Jun. 02, 2016
Applicant:

Sharp Kabushiki Kaisha, Sakai, Osaka, JP;

Inventor:

Hiroshi Matsukizono, Sakai, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/12 (2006.01); H01L 27/32 (2006.01); H01L 29/786 (2006.01); G02F 1/1368 (2006.01); G09F 9/30 (2006.01); H01L 51/50 (2006.01); H01L 29/66 (2006.01);
U.S. Cl.
CPC ...
H01L 27/1225 (2013.01); G02F 1/1368 (2013.01); G09F 9/30 (2013.01); H01L 27/124 (2013.01); H01L 27/1262 (2013.01); H01L 27/326 (2013.01); H01L 27/3241 (2013.01); H01L 27/3262 (2013.01); H01L 27/3276 (2013.01); H01L 27/3279 (2013.01); H01L 27/3297 (2013.01); H01L 29/66969 (2013.01); H01L 29/786 (2013.01); H01L 29/7869 (2013.01); H01L 51/50 (2013.01);
Abstract

An active matrix substrate () includes: a plurality of pixel regions arranged on a substrate () in a matrix pattern extending in a first and a second direction; a plurality of gate lines G extending in the first direction; and a plurality of source lines S extending in the second direction, the active matrix substrate having a display area () including a plurality of pixel regions and a non-display area () located in a periphery of the display area, wherein: the pixel regions each include a thin-film transistor () including an oxide semiconductor layer, and a pixel electrode () formed integral with a drain electrode (); gate electrode () and the gate lines G are made of a first transparent conductive film; the drain electrode () and the pixel electrode () are made of a second transparent conductive film and provided in the non-display area (); and the active matrix substrate further includes a plurality of gate signal lines made of a metal film and a first connecting portion that connects each of the gate lines G to one of the gate signal lines.


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