The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 30, 2019
Filed:
Apr. 29, 2015
Samsung Electronics Co., Ltd., Suwon-si, Gyeonggi-do, KR;
Hak-Young Kim, Bucheon-si, KR;
Ji-Myoung Lee, Seoul, KR;
Ji-Hee Kim, Goyang-si, KR;
Doug-Yong Sung, Seoul, KR;
Kyeong-Seok Jeong, Hwaseong-si, KR;
Seong-Chul Choi, Suwon-si, KR;
Abstract
A plasma processing device is provided. The plasma processing device includes a plate formed between a window covering a top portion of a chamber where plasma processing is performed and an antenna generating a magnetic field, and a fluid supply unit supplying a fluid for controlling temperatures of the window and the antenna, wherein the plate includes first and second regions supplied with the fluid, and the fluid supply unit independently controls the first and second regions.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile