The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 30, 2019
Filed:
Aug. 03, 2017
Applicant:
Canon Kabushiki Kaisha, Tokyo, JP;
Inventor:
Shunsuke Ota, Utsunomiya, JP;
Assignee:
CANON KABUSHIKI KAISHA, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 11/00 (2006.01); G03F 9/00 (2006.01); B29C 43/58 (2006.01); G03F 7/00 (2006.01); H01L 21/302 (2006.01);
U.S. Cl.
CPC ...
G03F 9/7069 (2013.01); B29C 43/58 (2013.01); G03F 7/0002 (2013.01); G03F 9/7042 (2013.01); B29C 2043/5808 (2013.01); B29C 2043/5816 (2013.01); B29C 2043/5875 (2013.01); H01L 21/302 (2013.01);
Abstract
An imprint apparatus which includes a plurality of stations in which an imprint material supplied to an imprint region on a substrate is formed using a mold and a pattern is formed in the imprint region. The imprint apparatus includes: a holder provided in each of the plurality of stations and configured to hold the substrate and to adjust a temperature of the substrate; and a controller configured to output a target value used to adjust the temperature to the holder in a station in which a pattern is formed in a substrate among the plurality of stations on the basis of a size of the imprint region and a temperature of the substrate.