The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 30, 2019
Filed:
Dec. 20, 2013
Nikon Corporation, Tokyo, JP;
Kazuhiko Fukazawa, Kamakura, JP;
NIKON CORPORATION, Tokyo, JP;
Abstract
Using a substrate on which a structure has been formed with a plurality of sets of processing conditions, the present disclosure provides an evaluation device that evaluates one of said sets of processing conditions with high precision. This evaluation device is provided with an illumination system that uses illuminating light to illuminate a wafer on which a pattern has been provided via exposure using a plurality of sets of exposure conditions, including first exposure conditions and second exposure conditions; a light-receiving system and an imaging unit the detect light coming from the surface of the wafer; and a computation unit that, on the basis of detection results obtained by the imaging unit using first diffraction conditions and second diffraction conditions that differ in terms of illumination conditions and/or detection conditions, and that estimates the first exposure conditions used when the wafer is exposed.