The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 30, 2019
Filed:
Jun. 14, 2017
Semes Co., Ltd., Chungcheongnam-do, KR;
Ki Seung Lee, Chungcheongnam-do, KR;
Chang Uk Park, Chungcheongnam-do, KR;
SEMES CO., LTD., Chungcheongnam-Do, KR;
Abstract
A substrate treating apparatus and a substrate treating method are provided. The substrate treating apparatus comprises: a process chamber; a support member positioned in an inner space of the process chamber to support the substrate; an exhaust line provided to communicate with the interior of the process chamber; an exhaust member for providing a suction pressure to the exhaust line; and a controller for controlling the exhaust member when dividing the substrate treating step in which the treating for the substrate is performed into the first treating step and the second treating step, a difference is generated between the pressure that the exhaust member provides to the exhaust line in the first treating step and the pressure that the exhaust member provides to the exhaust line in the second treating step.