The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 30, 2019

Filed:

Oct. 17, 2016
Applicant:

Marvell International Ltd., Hamilton, BM;

Inventors:

BoChih Liu, Shanghai, CN;

Zhike Jia, Fremont, CA (US);

Jinfeng Liu, Shanghai, CN;

Zhicui Lu, Shanghai, CN;

Juhong Xing, Shanghai, CN;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01S 19/27 (2010.01);
U.S. Cl.
CPC ...
G01S 19/27 (2013.01);
Abstract

Aspects of the disclosure include a method of prioritizing generation of predicted ephemeris data. The method includes receiving, by a device through a data network, first ephemeris seed data of a subset of a plurality of satellites, identifying a first satellite and a second satellite of the plurality of satellites, the first satellite being potentially detectable by the device at an estimated position at a given time, and the second satellite being potentially undetectable by the device at the estimated position at the given time, and prioritizing generation of first predicted ephemeris data that represent a first orbit of the first satellite before generation of second predicted ephemeris data that represent a second orbit of the second satellite. The generation of the first predicted ephemeris is based on the first ephemeris seed data.


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