The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 30, 2019
Filed:
Oct. 17, 2017
Applicant:
Toppan Printing Co., Ltd., Tokyo, JP;
Inventors:
Sumika Tamura, Tokyo, JP;
Naoko Mikami, Tokyo, JP;
Daisei Fujito, Tokyo, JP;
Kiyoaki Nishitsuji, Tokyo, JP;
Takehiro Nishi, Tokyo, JP;
Assignee:
TOPPAN PRINTING CO., LTD., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 51/00 (2006.01); H01L 51/50 (2006.01); H01L 51/52 (2006.01); C23C 14/02 (2006.01); C23C 14/04 (2006.01); C23C 14/08 (2006.01); C23C 14/12 (2006.01); C23C 14/22 (2006.01); C23F 1/02 (2006.01); C23F 1/44 (2006.01); G01N 21/55 (2014.01); G03F 7/00 (2006.01); C23F 1/14 (2006.01);
U.S. Cl.
CPC ...
C23C 14/042 (2013.01); C23C 14/024 (2013.01); C23C 14/028 (2013.01); C23C 14/085 (2013.01); C23C 14/12 (2013.01); C23C 14/225 (2013.01); C23F 1/02 (2013.01); C23F 1/14 (2013.01); C23F 1/44 (2013.01); G01N 21/55 (2013.01); G03F 7/0002 (2013.01); H01L 51/5012 (2013.01); H01L 51/5271 (2013.01); H01L 51/0011 (2013.01);
Abstract
A metal mask substrate includes a metal surface to which a resist is to be disposed. A specular reflectance of incident light to the surface is 45.2% or more.