The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 30, 2019
Filed:
Feb. 07, 2014
Kuraray Co., Ltd., Kurashiki-shi, JP;
Ryoichi Sasaki, Kurashiki, JP;
Kentaro Yoshida, Houston, TX (US);
Mamoru Omoda, Soja, JP;
Masakazu Nakaya, Kurashiki, JP;
Hiroyuki Ogi, Kurashiki, JP;
KURARAY CO., LTD., Kurashiki-shi, JP;
Abstract
A multilayer structure disclosed is a multilayer structure including at least one base (X), at least one layer (Y), and at least one layer (Z). The layer (Y) contains an aluminum atom. The layer (Z) contains a polymer (E) having a plurality of phosphorus atoms. The polymer (E) is a polymer of at least one monomer including a vinylphosphonic acid compound. The multilayer structure includes at least one pair of the layer (Y) and the layer (Z) that are contiguously stacked. The layer (Z) is formed by applying a coating liquid (V) which is a solution of the polymer (E) having a plurality of phosphorus atoms. The multilayer structure disclosed is excellent in gas barrier properties, and can maintain the gas barrier properties at a high level even when subjected to physical stresses such as deformation and impact.