The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 30, 2019
Filed:
Dec. 14, 2015
Applicant:
Corning Incorporated, Corning, NY (US);
Inventors:
Benedict Yorke Johnson, Horseheads, NY (US);
Prantik Mazumder, Ithaca, NY (US);
Kamal Kishore Soni, Painted Post, NY (US);
Assignee:
Corning Incorporated, Corning, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B32B 9/00 (2006.01); B32B 17/06 (2006.01); B32B 18/00 (2006.01); B32B 37/00 (2006.01); B32B 37/18 (2006.01); B32B 38/00 (2006.01); C01B 32/194 (2017.01); C23F 1/18 (2006.01);
U.S. Cl.
CPC ...
B32B 17/06 (2013.01); B32B 9/007 (2013.01); B32B 18/00 (2013.01); B32B 37/025 (2013.01); B32B 37/18 (2013.01); B32B 38/00 (2013.01); C01B 32/194 (2017.08); B32B 2250/02 (2013.01); B32B 2313/04 (2013.01); B32B 2315/02 (2013.01); B32B 2315/08 (2013.01); C04B 2237/52 (2013.01); C04B 2237/86 (2013.01); C23F 1/18 (2013.01);
Abstract
Described herein are methods for improved transfer of graphene from formation substrates to target substrates. In particular, the methods described herein are useful in the transfer of high-quality chemical vapor deposition-grown monolayers of graphene from metal, e.g., copper, formation substrates via non-polymeric methods. The improved processes provide graphene materials with less defects in the structure.