The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 23, 2019

Filed:

Nov. 01, 2016
Applicant:

Samsung Display Co., Ltd., Yongin-si, Gyeonggi-do, KR;

Inventors:

JeongMin Park, Seoul, KR;

Jung-Soo Lee, Seoul, KR;

Ji-Hyun Kim, Seoul, KR;

Sanggab Kim, Seoul, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/12 (2006.01); G02F 1/1362 (2006.01); G02F 1/1333 (2006.01);
U.S. Cl.
CPC ...
H01L 27/1288 (2013.01); G02F 1/1333 (2013.01); G02F 1/1362 (2013.01); H01L 27/124 (2013.01); H01L 27/127 (2013.01); G02F 2001/136231 (2013.01); G02F 2001/136236 (2013.01);
Abstract

A display apparatus includes a substrate and a plurality of pixels disposed on the substrate. Each pixel includes a gate electrode on the substrate, a common electrode insulated from the gate electrode on the substrate, a first insulating layer covering the gate electrode and the common electrode, a semiconductor pattern disposed on the first insulating layer to overlap with the gate electrode, source and drain electrodes disposed on the semiconductor pattern and spaced apart from each other, and a pixel electrode disposed on the first insulating layer to cover the drain electrode and form an electric field with the common electrode. The display apparatus may be manufactured by first to fourth photolithography processes using first to fourth masks, and the first mask may be a slit mask or a diffraction mask.


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