The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 23, 2019

Filed:

Jan. 22, 2016
Applicant:

Arm Limited, Cambridge, GB;

Inventors:

Abhilash V. Thazhathidathil, Bangalore, IN;

Denil Das Kolady, Bangalore, IN;

Anand Dhanalakshmi Ramdass, Bangalore, IN;

Assignee:

ARM Limited, Cambridge, GB;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/74 (2006.01); H01L 27/02 (2006.01); H01L 29/06 (2006.01); H01L 21/265 (2006.01); H01L 23/522 (2006.01); H01L 23/528 (2006.01); H01L 27/118 (2006.01); H01L 21/8234 (2006.01); H01L 21/8238 (2006.01); H01L 23/48 (2006.01); H01L 23/52 (2006.01); H01L 29/40 (2006.01);
U.S. Cl.
CPC ...
H01L 27/0207 (2013.01); H01L 21/743 (2013.01); H01L 21/823493 (2013.01); H01L 21/823892 (2013.01); H01L 23/528 (2013.01); H01L 23/5226 (2013.01); H01L 27/11807 (2013.01); H01L 29/0688 (2013.01); H01L 21/26513 (2013.01); H01L 2027/11861 (2013.01);
Abstract

Various implementations described herein are directed to an integrated circuit. The integrated circuit may include a cell having a first region designated for a first type of implant and a second region designated for a second type of implant that is different than the first type of implant. The integrated circuit may include a first implant structure configured to implant the first region with the first type of implant such that the first region extends within a portion of the second region. The integrated circuit may include a second implant structure configured to implant the second region with the second type of implant such that the second region extends within a portion of the first region.


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