The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 23, 2019

Filed:

Dec. 22, 2017
Applicants:

Tsinghua University, Beijing, CN;

Hon Hai Precision Industry Co., Ltd., New Taipei, TW;

Inventors:

Zhen-Dong Zhu, Beijing, CN;

Qun-Qing Li, Beijing, CN;

Shou-Shan Fan, Beijing, CN;

Assignees:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 5/18 (2006.01); C22F 1/02 (2006.01); C23F 1/02 (2006.01); C23F 4/00 (2006.01);
U.S. Cl.
CPC ...
G02B 5/1857 (2013.01); C23F 1/02 (2013.01); C23F 4/00 (2013.01); G02B 5/1809 (2013.01); G02B 2207/101 (2013.01);
Abstract

A method of making a pine shaped metal nano-scaled grating, the method including: forming a first metal layer on a substrate, forming an isolation layer on the first metal layer, and locating a second metal layer on the isolation layer; placing a first mask layer on the second metal layer, wherein the first mask layer comprises a body, and the body defines a plurality of openings parallel with and spaced apart from each other; etching the first mask layer and the second metal layer to obtain a plurality of triangular prism structures; etching the isolation layer to obtain a plurality of second rectangular structures using the plurality of triangular prism structures as a first mask; and etching the first metal layer to obtain a plurality of first rectangular structures using the plurality of second rectangular structures as a second mask.


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