The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 23, 2019
Filed:
Sep. 13, 2017
Qualcomm Incorporated, San Diego, CA (US);
Arvind Ramanandan, Sunnyvale, CA (US);
Murali Chari, San Diego, CA (US);
Yiming Chen, San Diego, CA (US);
Avdhut Joshi, Carlsbad, CA (US);
John Steven Lima, West Terre Haute, IN (US);
QUALCOMM Incorporated, San Diego, CA (US);
Abstract
A method for visual inertial odometry (VIO)-aided global positioning is described. The method includes updating an extended Kalman filter (EKF) state including a current pose and a sliding window of multiple prior poses. The sliding window includes poses at a number of most recent global positioning system (GPS) time epochs. Updating the EKF includes updating an EKF covariance matrix for the prior poses and the current pose in the EKF state. The method also includes determining, at a GPS epoch, a relative displacement between each of the updated prior poses and the current pose. The method further includes determining an error covariance of each of the relative displacements based on cross-covariances between each of the updated prior poses and the current pose in the EKF covariance matrix. The method additionally includes using the relative displacements and the error covariances to fuse pseudorange measurements taken over multiple epochs.