The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 23, 2019

Filed:

Oct. 27, 2015
Applicant:

Sysmex Corporation, Kobe-shi, Hyogo, JP;

Inventors:

Nobuyasu Hori, Kobe, JP;

Yuichi Yasuda, Kobe, JP;

Hiroya Kirimura, Kobe, JP;

Yuzuru Takamura, Kobe, JP;

Miyuki Chikae, Kobe, JP;

Assignee:

SYSMEX CORPORATION, Kobe-shi, Hyogo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 27/327 (2006.01); G01N 27/74 (2006.01); G01N 33/543 (2006.01);
U.S. Cl.
CPC ...
G01N 27/3278 (2013.01); G01N 27/3277 (2013.01); G01N 27/745 (2013.01); G01N 33/5438 (2013.01); G01N 33/54313 (2013.01);
Abstract

Disclosed is a method of detecting a test substance contained in a sample using a working electrode and a counter electrode. The method comprises (A) forming a complex on the working electrode, the complex comprising the test substance and a metal particle; (B) washing the working electrode; (C) adding a measurement solution to the working electrode and measuring a current, voltage or electric charge from the metal on the working electrode in the measurement solution by electrochemical measurement; and (D) detecting the test substance in the sample based on a measurement result obtained in the step (C). In the method, the step (B) comprises washing the working electrode using a measurement solution having the same composition as the composition of the measurement solution used in the step (C). In the method, pH of the measurement solution is set, based on zeta potentials of the metal particle and the working electrode, to pH in which no electrostatic interaction occurs between the metal particle and the working electrode or pH in which an electrostatic repulsive force occurs between the metal particle and the working electrode.


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