The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 23, 2019

Filed:

May. 06, 2013
Applicant:

Nederlandse Orgnisatie Voor Toegepast-natuurwetenschappelijk Onderzoek Tno, Delft, NL;

Inventors:

Lun Kai Cheng, Delft, NL;

Remco Alexander Nieuwland, Delft, NL;

Peter Martijn Toet, Delft, NL;

Michiel Peter Oderwald, Delft, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01M 11/00 (2006.01); G01D 5/353 (2006.01); G02B 7/00 (2006.01);
U.S. Cl.
CPC ...
G01M 11/30 (2013.01); G01D 5/35335 (2013.01); G02B 7/00 (2013.01); Y10T 29/49002 (2015.01);
Abstract

An optical sensor interrogation system can have a light source arranged for emitting light; a first optical arrangement arranged for intercepting the light and to forward the light to an optical sensor and to receive light therefrom. The wavelength reference is adapted to provide a reference wavelength. The system can further have a second optical arrangement adapted to receive reflected light from the optical sensor, a lens system for transferring the light into a beam and a scanning assembly including a scanning unit and/or a diffractive optical element. The system can still further have a detector for receiving optical response from the scanning assembly and a data processing system. A method is used to manufacture an optical sensor interrogation system.


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