The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 23, 2019

Filed:

Jul. 31, 2017
Applicant:

Fuchita Nanotechnology Ltd., Narita-shi, Chiba, JP;

Inventors:

Eiji Fuchita, Narita, JP;

Eiji Tokizaki, Narita, JP;

Eiichi Ozawa, Narita, JP;

Assignee:

Fuchita Nanotechnology Ltd., Narita-Shi, Chiba, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 24/02 (2006.01); C23C 14/34 (2006.01); H01J 37/34 (2006.01); C09D 5/00 (2006.01); B05D 1/12 (2006.01); B05D 1/00 (2006.01); B05D 1/06 (2006.01);
U.S. Cl.
CPC ...
C23C 14/34 (2013.01); C09D 5/00 (2013.01); C23C 24/02 (2013.01); H01J 37/3411 (2013.01); B05D 1/007 (2013.01); B05D 1/06 (2013.01); B05D 1/12 (2013.01);
Abstract

A deposition method includes: introducing a gas into an airtight container containing electrically insulated raw material particles to generate an aerosol of the raw material particles; transferring the aerosol to a deposition chamber through a transfer tubing connected to the airtight container, the deposition chamber having a pressure maintained to be lower than that of the airtight container; injecting the aerosol from a nozzle mounted on a tip of the transfer tubing toward a target placed on the deposition chamber to cause the raw material particles to collide with the target, thereby causing the raw material particles to be positively charged; generating fine particles of the raw material particles by discharge of the charged raw material particles; and depositing the fine particles on a substrate placed on the deposition chamber.


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