The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 16, 2019

Filed:

Aug. 30, 2017
Applicant:

Trumpf Lasersystems for Semiconductor Manufacturing Gmbh, Ditzingen, DE;

Inventor:

Martin Lambert, Korb, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05G 2/00 (2006.01); G02B 5/00 (2006.01); B23K 26/70 (2014.01);
U.S. Cl.
CPC ...
H05G 2/008 (2013.01); B23K 26/704 (2015.10); G02B 5/003 (2013.01);
Abstract

The disclosure relates to a beam trap including: a reflector for reflecting a beam, in particular a laser beam, that is incident on a surface of the reflector, and an absorber device for absorbing the beam reflected at the surface of the reflector. The surface of the reflector is segmented and has a plurality of reflector regions that are configured for reflecting a respective partial beam of the incident beam into an absorber region of the absorber device that is associated with the respective reflector region. The disclosure also relates to a beam guide device having a beam trap of this type, an EUV radiation generation apparatus having a beam guide device of this type, and an associated method for absorbing a beam, in particular for absorbing a laser beam.


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