The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 16, 2019
Filed:
Jan. 05, 2018
Applicant:
Asm Ip Holding B.v., Almere, NL;
Inventors:
Joe Margetis, Gilbert, AZ (US);
John Tolle, Gilbert, AZ (US);
Gregory Bartlett, Phoenix, AZ (US);
Nupur Bhargava, Phoenix, AZ (US);
Assignee:
ASM IP Holding B.V., Almere, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); C23C 16/455 (2006.01); C23C 16/24 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02636 (2013.01); C23C 16/24 (2013.01); C23C 16/455 (2013.01); C23C 16/45514 (2013.01); C23C 16/45574 (2013.01); H01L 21/0262 (2013.01); H01L 21/02529 (2013.01); H01L 21/02532 (2013.01); H01L 21/02535 (2013.01); H01L 21/02576 (2013.01); H01L 21/02579 (2013.01);
Abstract
A gas distribution system is disclosed in order to obtain better film uniformity on a substrate in a cross-flow reactor. The better film uniformity may be achieved by an asymmetric bias on individual injection ports of the gas distribution system. The gas distribution may allow for varied tunability of the film properties.