The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 16, 2019
Filed:
Jan. 10, 2017
Samsung Electronics Co., Ltd., Suwon-si, Gyeonggi-do, KR;
Nanotech Inc., Yongin-si, Gyeonggi-do, KR;
Pyung Moon, Seoul, KR;
Sung Ho Kang, Osan-si, KR;
Ki Chul Kim, Seongnam-si, KR;
Un Ki Kim, Suwon-si, KR;
Yong Hun Lee, Hwaseong-si, KR;
Jae Hee Lee, Daegu, KR;
Yong Seok Song, Seoul, KR;
Hang Mook Park, Seoul, KR;
Je Hoon Oh, Seoul, KR;
Abstract
A plasma monitoring device includes a fixing unit, a plasma measuring unit disposed to be in contact with the fixing unit, and measuring a luminous intensity of emitted light of a plasma to output a luminous intensity measurement value, a reference light source unit irradiating reference light having a uniform luminous intensity to the plasma measuring unit, and a control unit receiving the luminous intensity measurement value to calculate a luminous intensity value of the emitted light, controlling a voltage applied to the reference light source unit to uniformly control a luminous intensity of the reference light, comparing a luminous intensity of the reference light irradiated to the plasma measuring unit with a previously stored luminous intensity reference value to detect a correction factor, and applying the correction factor to a luminous intensity value of the emitted light to correct the luminous intensity measurement value.