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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10261371 B1

PDFFull Text
Date of Patent:
Apr. 16, 2019

Filed:

Jul. 23, 2014

Method for manufacturing glass substrate, glass substrate, and panel for display

Applicant:

Avanstrate Inc., Tokyo, JP;

Inventor:

Young Tae Park, Kyoto, JP;

Assignee:

AvanStrate Inc., Tokyo, JP;

Attorney:

Sughrue Mion, PLLC

Primary Examiner:

Dzung Tran

Int. Cl.
CPC ...
H01L 29/10 (2006.01); G02F 1/1362 (2006.01); H01L 27/12 (2006.01); H01L 29/423 (2006.01); H01L 29/786 (2006.01); C03C 15/00 (2006.01); G02F 1/1341 (2006.01); G02F 1/1368 (2006.01); G02F 1/1335 (2006.01); G02F 1/1333 (2006.01);
U.S. Cl.
CPC ...
G02F 1/136204 (2013.01); C03C 15/00 (2013.01); H01L 27/124 (2013.01); H01L 27/1218 (2013.01); H01L 27/1222 (2013.01); H01L 27/1225 (2013.01); H01L 27/1262 (2013.01); H01L 29/42384 (2013.01); H01L 29/7869 (2013.01); H01L 29/78672 (2013.01); G02F 1/1341 (2013.01); G02F 1/1368 (2013.01); G02F 1/133514 (2013.01); G02F 1/136286 (2013.01); G02F 2001/133302 (2013.01); G02F 2202/16 (2013.01);
Abstract

A method for manufacturing a glass substrate comprises a surface processing step of performing surface processing for forming unevenness on a glass surface. In the surface processing step, protruded portions having a height of 1nm or more from an average line of a roughness curve are dispersedly formed on the glass surface. In the surface processing step, the surface processing is performed such that a protruded portion area ratio is 0.5 to 10%. The protruded portion area ratio is a ratio of an area of the protruded portions with respect to an area of any rectangular region. The rectangular region has a square shape with a side length of 1 μm. In the surface processing step, in a case where the rectangular region is equally divided into at least one hundred divided regions having a square shape, the surface processing is performed such that a protruded portion content ratio is 80% or more. The protruded portion content ratio is a ratio of the number of divided regions having the protruded portions with respect to the number of divided regions included in the rectangular region.

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