The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 16, 2019
Filed:
Jan. 30, 2015
Canon U.s.a., Inc., Melville, NY (US);
The General Hospital Corporation, Boston, MA (US);
Guillermo J Tearney, Cambridge, MA (US);
Dongkyun Kang, Somerville, MA (US);
Mitsuhiro Ikuta, Cambridge, MA (US);
George M. Whitesides, Cambridge, MA (US);
Ramses V. Martinez, West Lafayette, IN (US);
Guillermo J Tearney, Cambridge, MA (US);
Dongkyun Kang, Somerville, MA (US);
Mitsuhiro Ikuta, Cambridge, MA (US);
George M. Whitesides, Cambridge, MA (US);
Ramses V. Martinez, West Lafayette, IN (US);
Canon USA, Inc., Melville, NY (US);
The General Hospital Corporation, Boston, MA (US);
Abstract
Exemplary method and system for providing a diffractive configuration in an optical arrangement are provided. For example, a material can be provided with at least one patterned surface having a very high aspect ratio. The material can be connected with at least one portion of a waveguide arrangement using a pre-polymer adhesive composition. Further, the pre-polymer adhesive composition can be caused to polymerize so as to form the diffractive configuration which at least approximately replicates a structure or at least one feature of the patterned surface.