The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 16, 2019
Filed:
Apr. 04, 2016
General Electric Company, Schenectady, NY (US);
Geng Fu, Rexford, NY (US);
Floribertus P M Heukensfeldt Jansen, Niskayuna, NY (US);
Jianjun Guo, Ballston Spa, NY (US);
Sergei Ivanovich Dolinsky, Clifton Park, NY (US);
General Electric Company, Schenectady, NY (US);
Abstract
A method for determining depth-of-interaction correction in a PET system. The method includes modifying crystal and readout configuration to improve depth-dependent arrival profile of scintillation photons, creating a photon dispersion model within a scintillator crystal, measuring photon arrival profile of individual gamma ray event, deriving an estimated depth-of-interaction, and deriving a gamma ray event time based on a time stamp corrected with the estimated depth-of-interaction. The method further includes modeling dispersion at different depths of interaction within the scintillator crystal, providing a reflector layer to delay back-reflected photons, providing two respective readouts for the same gamma ray event from two respective pixels optically coupled by a backside reflector or modified crystal configuration, calculating a time difference of the photon arrival at the two pixels, and estimating the depth-of-interaction by applying a statistical weighting.