The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 16, 2019
Filed:
Dec. 27, 2017
Industrial Technology Research Institute, Hsinchu, TW;
Po-Huang Shieh, Zhunan Township, Miaoli County, TW;
Po-Nien Tsou, Tainan, TW;
Wei-Chieh Chang, Tainan, TW;
Ming-Cheng Tsai, New Taipei, TW;
INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE, Chutung, Hsinchu, TW;
Abstract
An on-line measuring system, a datum calibrating method, a deviation measuring method and a computer-readable medium are provided. The datum calibrating method includes following steps. A work piece is scanned by a scanning unit to obtain a global point cloud data. A local CAD data of the work piece is obtained according to a predetermined range. A local CAD geometric feature of the local CAD data is obtained. A local point cloud data of the global point cloud data is obtained according to a local range corresponding to the predetermined range. A local scanning geometric feature of the local point cloud data is obtained. The local scanning geometric feature and the local CAD geometric feature are compared to obtain at least one spatial freedom limit. A system basis is obtained according to six spatial freedom limits, if the number of the at least one spatial freedom limit reaches six.