The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 16, 2019

Filed:

Aug. 25, 2014
Applicants:

Mitsubishi Heavy Industries, Ltd., Tokyo, JP;

National University Corporation Nagoya University, Aichi-ken, JP;

Inventors:

Takuya Yamazaki, Tokyo, JP;

Hirofumi Shimizu, Tokyo, JP;

Satoshi Fujiwara, Tokyo, JP;

Akihiro Sasoh, Aichi, JP;

Shigeru Yokota, Aichi, JP;

Shota Harada, Aichi, JP;

Teruaki Baba, Aichi, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
F03H 1/00 (2006.01); H05H 1/54 (2006.01); H01J 27/16 (2006.01); H05H 1/46 (2006.01);
U.S. Cl.
CPC ...
F03H 1/0081 (2013.01); H01J 27/16 (2013.01); H05H 1/46 (2013.01); H05H 1/54 (2013.01); H05H 2001/4667 (2013.01);
Abstract

Electrodeless plasma is supplied to a space between a cathode and an anode such that a resistivity in the space is reduced. The electrodeless plasma is accelerated with Lorentz force induced by a radial direction magnetic field component and an axial direction magnetic field component that are generated in the space, and current in the space.


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