The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 16, 2019
Filed:
Jun. 22, 2016
Shenzhen Dekia Science and Technology Co., Ltd., Nanshan District, Shenzhen, Guangdong, CN;
Shumin Zhang, Guangdong, CN;
Liang Xu, Guangdong, CN;
Changcheng Tang, Guangdong, CN;
Jian Peng, Guangdong, CN;
SHENZHEN DEKIA SCIENCE AND TECHNOLOGY CO., LTD., Shenzhen, Guangdong, CN;
Abstract
A method of self-adaption adjustment for post-printing treatment including steps of S: printing a plurality of identifiers on a paper sheet for positioning actual locations of treatment on the paper sheet; S: detecting the identifiers on the paper sheet, and locating the actual locations to be treated according to the locations of the identifiers and/or relative locations among the identifiers; and S: adjusting locations of treatment from a post-printing treatment mechanism to the paper sheet according to the actual locations output in step S. A system of self-adaption adjustment for post-printing treatment including a printing module, a detection module, a treatment module, a driving module and a post-printing treatment mechanism. The method and system realize the self-adaption adjustment, which effectively solves the problems that an actual value after skewing or stretching or shrinking the actual printing content is inconsistent with a theoretical value of typesetting, thus effectively improving the production efficiency and production quality, which has favorable economic and social benefits. The method and system can be widely applied in various post-printing treatment systems.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile