The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 09, 2019

Filed:

Apr. 25, 2016
Applicant:

Sony Corporation, Tokyo, JP;

Inventors:

Shun Mitarai, Kanagawa, JP;

Shusaku Yanagawa, Kanagawa, JP;

Hiroshi Ozaki, Kanagawa, JP;

Assignee:

Sony Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); H01L 21/48 (2006.01); H01L 23/498 (2006.01); H05K 3/42 (2006.01); H01L 21/683 (2006.01); H05K 1/03 (2006.01); H05K 3/46 (2006.01); H01L 21/288 (2006.01); H01L 23/00 (2006.01);
U.S. Cl.
CPC ...
H01L 21/486 (2013.01); H01L 21/6835 (2013.01); H01L 23/49827 (2013.01); H01L 23/49838 (2013.01); H01L 23/49866 (2013.01); H05K 3/423 (2013.01); H01L 21/2885 (2013.01); H01L 21/4857 (2013.01); H01L 23/49816 (2013.01); H01L 24/16 (2013.01); H01L 2221/68318 (2013.01); H01L 2221/68345 (2013.01); H01L 2221/68359 (2013.01); H01L 2221/68386 (2013.01); H01L 2224/16225 (2013.01); H01L 2224/32225 (2013.01); H01L 2224/73204 (2013.01); H01L 2924/15311 (2013.01); H05K 1/0306 (2013.01); H05K 3/4605 (2013.01); H05K 2201/09563 (2013.01); H05K 2203/0733 (2013.01);
Abstract

There is provided a method for manufacturing a wiring substrate with a through electrode, the method including providing a device substrate having a through hole, an opening of the through hole being blocked by a current supply path and the wiring substrate including the device substrate as a core layer with the through electrode; and disposing a first metal in the through hole to form the through electrode by electroplating, in a depth direction of the through hole, using the current supply path.


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