The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 09, 2019

Filed:

Aug. 08, 2014
Applicant:

Tdk Corporation, Tokyo, JP;

Inventors:

Masashi Miwa, Tokyo, JP;

Haruna Nakajima, Tokyo, JP;

Isao Kanada, Tokyo, JP;

Assignee:

TDK CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01F 1/059 (2006.01); H01F 1/053 (2006.01); H01F 1/057 (2006.01); H01F 41/02 (2006.01);
U.S. Cl.
CPC ...
H01F 1/0536 (2013.01); H01F 1/0577 (2013.01); H01F 41/0293 (2013.01);
Abstract

The present invention provides an R-T-B based sintered magnet having excellent corrosion resistance together with good magnetic properties. The R-T-B based sintered magnet contains RTB crystal grains, wherein, an R—Ga—Co—Cu—N concentrated part exists in a grain boundary formed between or among two or more adjacent RTB crystal grains, and the concentrations of R, Ga, Co, Cu and N in the R—Ga—Co—Cu—N concentrated part are higher than those in the RTB crystal grains respectively.


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Miwa, Masashi. (2019). R-t-b based sintered magnet and rotating machine (U.S. Patent No. 10256015). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10256015

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