The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 09, 2019
Filed:
Aug. 25, 2014
Applicant:
Zeon Corporation, Tokyo, JP;
Inventor:
Hiroaki Shindo, Tokyo, JP;
Assignee:
ZEON CORPORTION, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
C08F 2/46 (2006.01); C08F 2/50 (2006.01); C08G 61/04 (2006.01); G03F 7/037 (2006.01); G03F 7/023 (2006.01); G03F 7/027 (2006.01); G03F 7/032 (2006.01); G03F 7/033 (2006.01); G03F 7/075 (2006.01); G06F 3/041 (2006.01);
U.S. Cl.
CPC ...
G03F 7/037 (2013.01); G03F 7/027 (2013.01); G03F 7/0233 (2013.01); G03F 7/032 (2013.01); G03F 7/033 (2013.01); G03F 7/0757 (2013.01); G06F 3/041 (2013.01);
Abstract
A radiation-sensitive resin composition comprising a binder resin (A), quinone diazide-based photoacid generator (B), (meth)acrylate compound (C), and photopolymerization initiator (D) is provided. According to the present invention, it is possible to provide a radiation-sensitive resin composition which can give a resin film which exhibits a high adhesion to a substrate and is excellent in transparency, photosensitivity, and chemical resistance.