The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 09, 2019
Filed:
Jul. 19, 2017
Sung-bo Shim, Hwasung-si, KR;
Jeonghoon Ko, Seoul, KR;
Jehyun Lee, Suwon-si, KR;
Jaehoon Jeong, Hwaseong-si, KR;
Sung-Bo Shim, Hwasung-si, KR;
Jeonghoon Ko, Seoul, KR;
Jehyun Lee, Suwon-si, KR;
Jaehoon Jeong, Hwaseong-si, KR;
Samsung Electronics Co., Ltd., Suwon-si, Gyeonggi-do, KR;
Abstract
A method of inspecting patterns formed the manufacturing of semiconductor devices or the like includes producing an image of the patterns, producing a boundary image including a plurality of boundary patterns corresponding to first and second boundaries of each of the patterns, combining the pattern image and the boundary image to produce an overlapping image including overlapping patterns in which the patterns fill regions between the boundary patterns, and binarizing the overlapping image to produce a binary image including binary patterns corresponding to the overlapping patterns.