The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 02, 2019

Filed:

Oct. 04, 2016
Applicant:

Xiamen Sanan Optoelectronics Technology Co., Ltd., Xiamen, CN;

Inventors:

Chaoyu Wu, Xiamen, CN;

Kunhuang Cai, Xiamen, CN;

Yi-An Lu, Xiamen, CN;

Chun-Yi Wu, Xiamen, CN;

Ching-Shan Tao, Xiamen, CN;

Duxiang Wang, Xiamen, CN;

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01L 33/30 (2010.01); H01L 33/22 (2010.01); H01L 21/66 (2006.01); H01L 33/00 (2010.01); H01L 33/06 (2010.01); H01L 33/40 (2010.01);
U.S. Cl.
CPC ...
H01L 33/305 (2013.01); H01L 22/12 (2013.01); H01L 33/0062 (2013.01); H01L 33/22 (2013.01); H01L 33/06 (2013.01); H01L 33/405 (2013.01); H01L 2933/0016 (2013.01);
Abstract

A high-brightness light-emitting diode with surface microstructure and preparation and screening methods thereof are provided. The ratio of total roughened surface area of light transmission surface of a light emitting diode to vertically projected area is greater than 1.5, and the peak density of light transmission surface is not less than 0.3/um. The higher the ratio of total roughened surface area of an epitaxial wafer to vertically projected area and the higher the number of peak over the critical height within a unit area, the more beneficial to improve light extraction efficiency of the epitaxial wafer. As a result, light extraction efficiency of the epitaxial wafer is greatly improved.


Find Patent Forward Citations

Loading…