The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 02, 2019

Filed:

Feb. 09, 2018
Applicant:

Toshiba Memory Corporation, Minato-ku, JP;

Inventors:

Atsushi Hieno, Yokohama, JP;

Tsutomu Nakanishi, Yokohama, JP;

Yusuke Tanaka, Kawasaki, JP;

Yasuhito Yoshimizu, Yokkaichi, JP;

Akihiko Happoya, Yokohama, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 18/18 (2006.01); H01L 21/768 (2006.01); H01L 23/00 (2006.01); C23C 18/31 (2006.01); C23C 18/16 (2006.01);
U.S. Cl.
CPC ...
H01L 21/76874 (2013.01); C23C 18/1605 (2013.01); C23C 18/1882 (2013.01); C23C 18/31 (2013.01); H01L 24/03 (2013.01); H01L 24/08 (2013.01); H01L 2224/03464 (2013.01); H01L 2224/08145 (2013.01);
Abstract

A method for forming a metal wiring according to embodiments includes forming a first insulating layer on a substrate; forming a catalyst adsorption layer by bringing a surface of the first insulating layer into contact with a solution containing a compound having a triazine skeleton, a first functional group of one of a silanol group and an alkoxysilyl group, and a second functional group of at least one selected from the group consisting of an amino group, a thiol group, a carboxyl group, and an azide group; forming a second insulating layer different from the first insulating layer on the catalyst adsorption layer; patterning the second insulating layer to form a mask pattern; etching the first insulating layer by a wet etching method; selectively forming a catalyst layer; and forming a metal layer on the catalyst layer by an electroless plating method.


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