The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 02, 2019
Filed:
May. 09, 2017
Applicant:
Shin-etsu Chemical Co., Ltd., Tokyo, JP;
Inventors:
Masaki Ohashi, Joetsu, JP;
Ryosuke Taniguchi, Joetsu, JP;
Assignee:
SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/039 (2006.01); G03F 7/20 (2006.01); H01L 21/027 (2006.01); C08K 5/375 (2006.01); C07C 291/00 (2006.01); C07C 381/12 (2006.01); C09D 133/06 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0397 (2013.01); C07C 291/00 (2013.01); C07C 381/12 (2013.01); C08K 5/375 (2013.01); C09D 133/062 (2013.01); G03F 7/0045 (2013.01); G03F 7/0046 (2013.01); G03F 7/2002 (2013.01); G03F 7/2041 (2013.01); H01L 21/0274 (2013.01);
Abstract
A sulfonium compound having formula (1) exerts a satisfactory acid diffusion control function wherein R, Rand Rare a C-Cmonovalent hydrocarbon group which may contain a heteroatom, p=0-5, q=0-5, and r=0-4. A resist composition comprising the sulfonium compound is processed by lithography to form a resist pattern with improved resolution, LWR, MEF and CDU.