The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 02, 2019
Filed:
Nov. 25, 2013
Applicant:
Korea Institute of Industrial Technology, Seobuk-gu, Chungcheongnam-do, KR;
Inventors:
Assignee:
KOREA INSTITUTE OF INDUSTRIAL TECHNOLOGY, Cheonan-si, Chungcheongnam-do, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 5/30 (2006.01); B29D 11/00 (2006.01); G02F 1/1337 (2006.01); G02B 27/26 (2006.01); G02F 1/13363 (2006.01);
U.S. Cl.
CPC ...
G02B 5/3083 (2013.01); B29D 11/00644 (2013.01); G02B 27/26 (2013.01); G02F 1/133788 (2013.01); G02F 2001/133631 (2013.01); Y10T 428/24802 (2015.01);
Abstract
The present invention relates to a method for manufacturing a patterned retarder including an optical alignment layer or a first domain optically aligned in a first direction and a second domain optically aligned in a second direction. According to the invention, it is possible to improve productivity and to maximize optical alignment efficiency by reducing an optical alignment processing time using polarized pulse UV.