The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 02, 2019

Filed:

Jun. 10, 2015
Applicant:

Infineon Technologies Ag, Neubiberg, DE;

Inventors:

Karl Pilch, Villach, AT;

Sonja Muringer, Niederdorf, AT;

Assignee:

INFINEON TECHNOLOGIES AG, Neubiberg, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23F 1/08 (2006.01); B05C 11/00 (2006.01); C23F 1/14 (2006.01); B05C 5/00 (2006.01); B05D 1/00 (2006.01); H01L 21/67 (2006.01); H01L 21/306 (2006.01); H01L 31/00 (2006.01); H01L 21/66 (2006.01);
U.S. Cl.
CPC ...
C23F 1/08 (2013.01); B05C 5/00 (2013.01); B05C 11/00 (2013.01); B05D 1/00 (2013.01); B05D 1/002 (2013.01); C23F 1/14 (2013.01); H01L 21/30604 (2013.01); H01L 21/6708 (2013.01); H01L 22/12 (2013.01); H01L 22/20 (2013.01); H01L 31/00 (2013.01);
Abstract

A method for etching a workpiece may be provided, which may include: determining a plurality of reference etch profiles for a plurality of positions of an etchant dispenser, each reference etch profile corresponding to a respective position of the plurality of positions of the etchant dispenser; determining a thickness profile of the workpiece; determining a respective etch duration for each position of the plurality of positions of the etchant dispenser based on the determined thickness profile and the plurality of reference etch profiles, to reduce a total thickness variation of the workpiece; and dispensing an etchant over the workpiece via the etchant dispenser for the determined respective etch duration for each position of the plurality of positions.


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