The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 26, 2019

Filed:

Dec. 11, 2017
Applicant:

Olympus Corporation, Hachioji-shi, Tokyo, JP;

Inventors:

Yukie Yamazaki, Hachioji, JP;

Kazumasa Kunugi, Hino, JP;

Tetsuo Kikuchi, Hachioji, JP;

Assignee:

Olympus Corporation, Tokyo, JP;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G02B 7/04 (2006.01); G02B 7/34 (2006.01); H04N 5/232 (2006.01);
U.S. Cl.
CPC ...
H04N 5/23212 (2013.01); G02B 7/04 (2013.01); G02B 7/34 (2013.01);
Abstract

In a focus adjustment device that images a subject that has been subjected to pupil division to generate image data, and carries out a focus adjustment operation based on the image data, a focus adjustment operation is carried out based on a first phase difference amount in the event that it has been determined that the first phase difference amount is larger than a first threshold value, and then by executing focus detection after the focus adjustment operation, in the event that it has been determined that reliability of both the first phase difference amount and the second phase difference amount is high, and that a difference between the two is smaller than a second threshold value, and that it has been determined that the first phase difference amount is smaller than the first threshold value, a focus adjustment operation is carried out based on a second phase difference amount.


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