The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 26, 2019
Filed:
May. 26, 2017
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Jeffrey W. Anthis, San Jose, CA (US);
David Thompson, San Jose, CA (US);
Benjamin Schmiege, Santa Clara, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/302 (2006.01); H01L 21/465 (2006.01); H01L 21/02 (2006.01); H01L 21/3213 (2006.01); H01L 21/28 (2006.01);
U.S. Cl.
CPC ...
H01L 21/465 (2013.01); H01L 21/0228 (2013.01); H01L 21/02565 (2013.01); H01L 21/28194 (2013.01); H01L 21/32135 (2013.01);
Abstract
A process to selectively etch a substrate surface comprising multiple metal oxides comprising exposing the substrate surface to a halogenation agent, and then exposing the substrate surface to a ligand transfer agent. The etch rate of the metals in the multiple metal oxides is substantially uniform.